Chemical vapor deposition

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51/private/tmp/tp88cd5aee_3ed4_48d7_827a_f000ea20ad7e.ps

/private/tmp/tp88cd5aee_3ed4_48d7_827a_f000ea20ad7e.ps

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Source URL: www.atmos-chem-phys.org

Language: English - Date: 2015-05-04 02:51:08
52Invited paper 225th ECS Meeting, Orlando, USA, May 12-16, 2014 Spatial ALD, Deposition of Al2O3 Films at Throughputs Exceeding 3000 Wafers per Hour E.H.A. Granneman, V.I. Kuznetsov and P. Vermont Levitech BV, Versterkers

Invited paper 225th ECS Meeting, Orlando, USA, May 12-16, 2014 Spatial ALD, Deposition of Al2O3 Films at Throughputs Exceeding 3000 Wafers per Hour E.H.A. Granneman, V.I. Kuznetsov and P. Vermont Levitech BV, Versterkers

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Source URL: www.levitech.nl

Language: English - Date: 2014-12-04 05:12:12
53Manuscript Title in Title Case

Manuscript Title in Title Case

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Source URL: www.djs.si

Language: English - Date: 2013-11-20 15:37:18
54

PDF Document

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Source URL: www.imber.info

Language: English - Date: 2013-02-22 03:51:08
55Microsoft Word - ISPC2015_List-of-poster-presentations.docx

Microsoft Word - ISPC2015_List-of-poster-presentations.docx

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Source URL: www.uantwerpen.be

Language: English - Date: 2015-05-16 09:22:26
56Overview of the H-1 National Facility B. D. Blackwell, J. H. Harris, J. Howard, M. G. Shats, C. Charles, S. M. Collis, F. J. Glass, D.G. Pretty, C. A. Michael, H. Punzmann, W. M. Solomon, G. G. Borg, I.H.Hutchinson* Plas

Overview of the H-1 National Facility B. D. Blackwell, J. H. Harris, J. Howard, M. G. Shats, C. Charles, S. M. Collis, F. J. Glass, D.G. Pretty, C. A. Michael, H. Punzmann, W. M. Solomon, G. G. Borg, I.H.Hutchinson* Plas

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Source URL: wwwrsphysse.anu.edu.au

Language: English - Date: 2002-07-03 20:10:07
57Electron Beam Evaporator E-Beam Evaporator - The e -flux Mini E-Beam Evaporator is an evaporator for small and medium quantities of almost any material in the temperature range of 400K to 3100K. Evaporation is possible

Electron Beam Evaporator E-Beam Evaporator - The e -flux Mini E-Beam Evaporator is an evaporator for small and medium quantities of almost any material in the temperature range of 400K to 3100K. Evaporation is possible

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Source URL: www.tectra.de

Language: English - Date: 2010-10-03 07:16:00
58ARTICLE Received 7 Jun 2014 | Accepted 11 Feb 2015 | Published 18 Mar 2015 DOI: ncomms7620  Single-step deposition of high-mobility graphene

ARTICLE Received 7 Jun 2014 | Accepted 11 Feb 2015 | Published 18 Mar 2015 DOI: ncomms7620 Single-step deposition of high-mobility graphene

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Source URL: kni.caltech.edu

Language: English - Date: 2015-03-18 17:06:44
59APPLIED PHYSICS LETTERS 104, Ballistic transport in graphene grown by chemical vapor deposition V. E. Calado,1,a) Shou-En Zhu,2,a) S. Goswami,1 Q. Xu,1 K. Watanabe,3 T. Taniguchi,3 G. C. A. M. Janssen,2 an

APPLIED PHYSICS LETTERS 104, Ballistic transport in graphene grown by chemical vapor deposition V. E. Calado,1,a) Shou-En Zhu,2,a) S. Goswami,1 Q. Xu,1 K. Watanabe,3 T. Taniguchi,3 G. C. A. M. Janssen,2 an

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Source URL: vandersypenlab.tudelft.nl

Language: English - Date: 2014-03-18 14:25:29
60Appendices  Appendices 175

Appendices Appendices 175

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Source URL: dspace.fsktm.um.edu.my

Language: English - Date: 2009-12-03 00:39:18